碳化鉭

CAS號:: 12070-07-4

英文名:: TANTALUM CARBIDE

英文別名:: Einecs 235-119-9;ditantalum monocarbide;Tantalum carbide (ta2C);Tantalum carbide sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.125in) thick, 99.95% (metals basi;Tantalum carbide sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.95% (metals basi;Tantalum carbide sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.250in) thick, 99.95% (metals basi;Tantalum carbide sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.5% (metals basis);Tantalum carbide sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.125in) thick, 99.5% (metals basis)

中文名:: 碳化鉭

中文別名:: 碳化鉭濺射靶,50.8MM(2.0IN)DIAX3.18MM(0.125IN)THICK,99.5%(METALSBASIS);碳化鉭濺射靶76.2MM(3.0IN)DIAX6.35MM(0.250IN)THICK,99.95%(METALSBASIS);碳化鉭濺射靶,76.2MM(3.0IN)DIAX3.18MM(0.125IN)THICK,99.95%(METALSBASIS);碳化鉭濺射靶,50.8MM(2.0IN)DIAX6.35MM(0.250IN)THICK,99.95%(METALSBASIS);碳化鉭濺射靶, 76.2MM (3.0IN) 直徑 X 3.18MM (0.125IN) 厚, 99.5%(METALS BASIS);碳化鉭濺射靶,50.8MM (2.0IN)直徑 X 6.35MM (0.250IN)厚,99.5%(METALS BASIS)BASIS)

CBNumber:: CB8325802

分子式:: CTa

分子量:: 192.96

MOL File:: 12070-07-4.mol

化學(xué)性質(zhì) 安全信息用途供應(yīng)商 4

碳化鉭化學(xué)性質(zhì)

熔點(diǎn):: 3327°C

密度:: 15.100

形態(tài):: refractory hexagonal crystals

顏色:: refractory hexagonal, hexane crystals, crystalline

電阻率 (resistivity):: 80.0 (ρ/μΩ.cm)

晶體結(jié)構(gòu):: Hexagonal

EPA化學(xué)物質(zhì)信息:: Tantalum carbide (Ta2C) (12070-07-4)

安全信息

WGK Germany:	3

TSCA:	TSCA listed

碳化鉭性質(zhì)、用途與生產(chǎn)工藝

碳化鉭上下游產(chǎn)品信息

上游原料

下游產(chǎn)品

碳化鉭生產(chǎn)廠家

全球有 4家供應(yīng)商碳化鉭國內(nèi)生產(chǎn)廠家

供應(yīng)商	聯(lián)系電話	電子郵件	國家	產(chǎn)品數(shù)	優(yōu)勢度
上海聯(lián)田材料科技有限公司	13370066691; 13370066691	3692356620@qq.com	中國	204	58
成都康巴斯生物科技有限公司	18582381569	18582381569@163.com	中國	4991	58

12070-07-4, 碳化鉭相關(guān)搜索:

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Catalysis and Inorganic Chemistry
Tantalum
碳化鉭濺射靶,76.2MM(3.0IN)DIAX3.18MM(0.125IN)THICK,99.95%(METALSBASIS)
碳化鉭濺射靶,50.8MM(2.0IN)DIAX6.35MM(0.250IN)THICK,99.95%(METALSBASIS)
碳化鉭濺射靶,50.8MM(2.0IN)DIAX3.18MM(0.125IN)THICK,99.5%(METALSBASIS)
碳化鉭濺射靶76.2MM(3.0IN)DIAX6.35MM(0.250IN)THICK,99.95%(METALSBASIS)
碳化鉭濺射靶,50.8MM (2.0IN)直徑 X 6.35MM (0.250IN)厚,99.5%(METALS BASIS)BASIS)
碳化鉭濺射靶, 76.2MM (3.0IN) 直徑 X 3.18MM (0.125IN) 厚, 99.5%(METALS BASIS)
12070-07-4
Tantalum carbide sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.125in) thick, 99.95% (metals basi
Tantalum carbide sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.95% (metals basi
Tantalum carbide sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.250in) thick, 99.95% (metals basi
ditantalum monocarbide
Tantalum carbide (ta2C)
Einecs 235-119-9
Tantalum carbide sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.5% (metals basis)
Tantalum carbide sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.125in) thick, 99.5% (metals basis)

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碳化鉭