SILICON(IV) OXIDE SPUTTERING TARGET, 76.2MM (3.0IN) DIA X 6.35MM (0.250IN) THICK, 99.995% (METALS BASIS)

SILICON(IV) OXIDE SPUTTERING TARGET, 76.2MM (3.0IN) DIA X 6.35MM (0.250IN) THICK, 99.995% (METALS BASIS) 試劑級(jí)價(jià)格

CAS號(hào):

英文名:: SILICON(IV) OXIDE SPUTTERING TARGET, 76.2MM (3.0IN) DIA X 6.35MM (0.250IN) THICK, 99.995% (METALS BASIS)

英文別名:: SILICON(IV) OXIDE SPUTTERING TARGET, 76.2MM (3.0IN) DIA X 6.35MM (0.250IN) THICK, 99.995% (METALS BASIS)

中文名:

中文別名:

CBNumber:: CB9660186

分子式:: O2Si

分子量:: 60.0843

MOL File:: Mol file

化學(xué)性質(zhì) 安全信息用途價(jià)格供應(yīng)商 0

SILICON(IV) OXIDE SPUTTERING TARGET, 76.2MM (3.0IN) DIA X 6.35MM (0.250IN) THICK, 99.995% (METALS BASIS)化學(xué)性質(zhì)

安全信息

SILICON(IV) OXIDE SPUTTERING TARGET, 76.2MM (3.0IN) DIA X 6.35MM (0.250IN) THICK, 99.995% (METALS BASIS)性質(zhì)、用途與生產(chǎn)工藝

SILICON(IV) OXIDE SPUTTERING TARGET, 76.2MM (3.0IN) DIA X 6.35MM (0.250IN) THICK, 99.995% (METALS BASIS) 上下游產(chǎn)品信息

上游原料

下游產(chǎn)品

SILICON(IV) OXIDE SPUTTERING TARGET, 76.2MM (3.0IN) DIA X 6.35MM (0.250IN) THICK, 99.995% (METALS BASIS) 試劑級(jí)價(jià)格

更新日期	產(chǎn)品編號(hào)	產(chǎn)品名稱	CAS編號(hào)	包裝	價(jià)格
2026/03/03	041099	二氧化硅(IV)濺射靶, 76.2mm (3.0in) 直徑 x 6.35mm (0.250in) 厚, 99.995% (metals basis) Silicon(IV) oxide sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.250in) thick, 99.995% (metals basis)		1each	5027元

SILICON(IV) OXIDE SPUTTERING TARGET, 76.2MM (3.0IN) DIA X 6.35MM (0.250IN) THICK, 99.995% (METALS BASIS) 生產(chǎn)廠家

全球有 0家供應(yīng)商 SILICON(IV) OXIDE SPUTTERING TARGET, 76.2MM (3.0IN) DIA X 6.35MM (0.250IN) THICK, 99.995% (METALS BASIS)國內(nèi)生產(chǎn)廠家

SILICON(IV) OXIDE SPUTTERING TARGET, 76.2MM (3.0IN) DIA X 6.35MM (0.250IN) THICK, 99.995% (METALS BASIS) 相關(guān)搜索:

SILICON(IV) OXIDE SPUTTERING TARGET, 76.2MM (3.0IN) DIA X 6.35MM (0.250IN) THICK, 99.995% (METALS BASIS)

本網(wǎng)站展示的所有產(chǎn)品僅用于工業(yè)應(yīng)用或者科學(xué)研究等非醫(yī)療目的,不可用于人類或動(dòng)物的臨床診斷或者治療,非藥用,非食用。
根據(jù)相關(guān)法律法規(guī)和本站規(guī)定，單位或個(gè)人購買相關(guān)危險(xiǎn)物品應(yīng)取得有效的資質(zhì)、資格條件。
Copyright 2016 © ChemicalBook. All rights reserved

一二三四区视频,亚洲少妇熟女色,日本久热无码视频网,欧美国产日韩大尺度,亚洲a视频,久久少妇一区二区,日韩999无码视频,刺激久久久久久久,啊啊啊啊不要啊在线

SILICON(IV) OXIDE SPUTTERING TARGET, 76.2MM (3.0IN) DIA X 6.35MM (0.250IN) THICK, 99.995% (METALS BASIS)

SILICON(IV) OXIDE SPUTTERING TARGET, 76.2MM (3.0IN) DIA X 6.35MM (0.250IN) THICK, 99.995% (METALS BASIS)化學(xué)性質(zhì)

SILICON(IV) OXIDE SPUTTERING TARGET, 76.2MM (3.0IN) DIA X 6.35MM (0.250IN) THICK, 99.995% (METALS BASIS)性質(zhì)、用途與生產(chǎn)工藝

SILICON(IV) OXIDE SPUTTERING TARGET, 76.2MM (3.0IN) DIA X 6.35MM (0.250IN) THICK, 99.995% (METALS BASIS) 上下游產(chǎn)品信息

上游原料

下游產(chǎn)品

SILICON(IV) OXIDE SPUTTERING TARGET, 76.2MM (3.0IN) DIA X 6.35MM (0.250IN) THICK, 99.995% (METALS BASIS) 試劑級(jí)價(jià)格

SILICON(IV) OXIDE SPUTTERING TARGET, 76.2MM (3.0IN) DIA X 6.35MM (0.250IN) THICK, 99.995% (METALS BASIS) 生產(chǎn)廠家

SILICON(IV) OXIDE SPUTTERING TARGET, 76.2MM (3.0IN) DIA X 6.35MM (0.250IN) THICK, 99.995% (METALS BASIS) 相關(guān)搜索: