Product Details
| Product Name: TRIETHYLENE GLYCOL MONOMETHYL ETHER Factory | CAS No.: 112-35-6 |
| Min. Order: 1kg | Purity: Heavy metal < 1-10 ppb |
| Supply Ability: High quality Factory | Release date: 2020/06/02 |
| Product Name: | TRIETHYLENE GLYCOL MONOMETHYL ETHER |
| Synonyms: | Triethylene glycol monomethyl;PEG-3 METHYL ETHER;Ethanol, 2-2-(2-methoxyethoxy)ethoxy-;2-(2-(2-Metoxyethoxy)ethoxy)ethanol;3,6,9-Trioxadecan-1-ol;Triethylene glycol monomethyl ether,Methyltriglycol;MPEG3-OH;2-[2-(2-Methoxyethoxy)ethoxy]ethan-1-ol |
| CAS: | 112-35-6 |
| MF: | C7H16O4 |
| MW: | 164.2 |
| EINECS: | 203-962-1 |
| Product Categories: | Ethylene Glycols & Monofunctional Ethylene Glycols;Monofunctional Ethylene Glycols;Hydroxy;Materials Science;Monofunctional PEGs;Poly(ethylene glycol) and Poly(ethylene oxide);Polymer Science;Polymers;pharm intermediate |
Ethylene glycol monomethyl ether series (EM, DEM, TEM)
|
Item |
Ethylene glycol monomethyl ether (EM) |
Di-ethylene glycol monomethyl ether (DEM) |
Triethylene glycol monomethyl ether (TEM) |
|
CAS |
109-86-4 |
111-77-3 |
112-35-6 |
|
Molecular formula |
CH3OCH2CH2OH |
CH3OCH2CH2OCH2CH2OH |
CH3O(C2H4O)3H |
|
Appearance |
Colorless and clear liquid |
Colorless and clear liquid |
Colorless and clear liquid |
|
Purity(GC)%≥ |
99.5 |
99.0 |
98.0 |
|
Distillation range(℃/760mmHg) |
122.5-127.0 |
191.0-198.0 |
230.0-250.0 |
|
Moisture(KF) %≤ |
0.1 |
0.1 |
0.1 |
|
Acidity |
0.01 |
/ |
/ |
|
Specific gravity(d420) |
0.965±0.005 |
1.018±0.005 |
1.049±0.005 |
|
Color(Pt-Co)≤ |
10 |
15 |
30 |
|
Content of metal ion≤ |
10ppb(for special requirements ≤1ppb) |
10ppb(for special requirements ≤1ppb) |
10ppb(for special requirements ≤1ppb) |
|
Package and transportation |
190 or 200KGS/Drum Hazardous chemical |
200KGS/Drum Common chemical |
200KGS/Drum Common chemical |
Application:
Ethylene glycol monomethyl ether series, a kind of electronic industry solvent with excellent performance, is widely used LCD photo-resistance diluent in the production of LCD and optical resist, photo-resist remover, stripping agent, detergent for IC, photo resist-removing buffer solution, corrosive processing and other chemicals requiring special specification; also widely applied as solvent for electronic material production.
Chemwill Asia co.,Ltd is one of the leading manufacturer in CHINA.
Our main production base is located in Xuzhou industry park. We produce a wide range of organics including Active pharmaceutical ingredients(APIs), Veterinary, Indole derivatives, Aromatics, Fluorine, Boronic acids, organocatalysts, chiral building blocks, heterocyclic compounds. We are certified both to the ISO 9001 and ISO 14001 Standards, have a safety management system in place.
Our R&D team masters core technology for process-design of target building block as well as Tailor-made fine chemicals. Our manufactory specialised in extreme temperature conditions (-100ºC to +300ºC), hydrogenations reaction under high pressure, suzuki coupling reaction, photochemical reaction, Mitsunobu reactions, enantioselective reactions and asymmetric synthesis.
Think Chemistry,Think CHemWill
Factory Plant Address:
High-Tech Industrial park,Chemical Economical Development Zone,Xuzhou, Jiangsu-Province, P.R.China
Shanghai office: (Export Department)
Address: 16FL., INDUSTRY & COMMERCIAL BUILDING, NO.45 YAN’AN ROAD(E), 200002, SHANGHAI, CHINA
---any inquiries will be replied within 12 hours.
---golden manufactory under iso/gmp with large stock.
---dedication to quality,we have strict quality control system.
---oem/odm available.
---sample is available for your evaluation & formulation development.
PLS contact
Ms Ella Lee - Deputy Sales Manager
Email: chemwill_asia@126.com;ch
Company Profile Introduction
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China- Since: 2004-09-01
- Address: BLDG 9,No.235 Sanlin road,Pudong new district,Shanghai,China