二硅化鈦
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- CAS號(hào):
- 12039-83-7
- 英文名:
- TITANIUM SILICIDE
- 英文別名:
- TITANIUM SILICIDE;Titanium disilicon;Titanium disilicde;TITANIUM DISILICIDE;titanium(IV) silicide;titaniumsilicide(tisi2);Titanium silicSIT8042.0;Titanium silicide, 99.5%;Titaniumsilicide(99+%-Ti);TITANIUM SILICIDE, POWDER
- 中文名:
- 二硅化鈦
- 中文別名:
- 硅化鈦;二硅化鈦;硅化鈦粉;二硅化鈦粉;硅化鈦濺射靶;多層 TI3C2TX;硅化鈦(TISI2);二硅化鈦 TISI2;二矽化鈦超微粉末,APS 20-30NM;硅化鈦濺射靶, 50.8MM (2.0IN) DIA X 3.18MM (0.125IN) THICK,
- CBNumber:
- CB00136487
- 分子式:
- Si2Ti
- 分子量:
- 104.04
- MOL File:
- 12039-83-7.mol
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二硅化鈦化學(xué)性質(zhì)
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熔點(diǎn):
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1540°C
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沸點(diǎn):
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1540°C
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密度:
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4,39 g/cm3
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RTECS號(hào):
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XR2420000
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溶解度:
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insoluble in H2O, acid solutions, alkaline solutions; soluble in HF
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形態(tài):
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Powder
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顏色:
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Gray
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電阻率 (resistivity):
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123 (ρ/μΩ.cm)
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水溶解性:
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Soluble in hydrofluoric acid. Insoluble in water.
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晶體結(jié)構(gòu):
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Orthorhombic
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EPA化學(xué)物質(zhì)信息:
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Titanium silicide (TiSi2) (12039-83-7)
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二硅化鈦性質(zhì)、用途與生產(chǎn)工藝
生產(chǎn)方法
1.將金屬鈦和金屬硅放入電弧爐內(nèi)，在氬氣氣氛下于1100℃熔融制得二硅化鈦。
2.
采用合成法。將金屬鈦和金屬硅放入電弧爐內(nèi)，在氬氣氣氛下于1100℃熔融，即制得二硅化鈦。
二硅化鈦
上下游產(chǎn)品信息
上游原料
下游產(chǎn)品
| 更新日期 | 產(chǎn)品編號(hào) | 產(chǎn)品名稱 | CAS編號(hào) | 包裝 | 價(jià)格 |
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| 2026/03/03 | 013088 | 硅化鈦, 99.5% (metals basis)
Titanium silicide, 99.5% (metals basis) | 12039-83-7 | 250g | 3076元 |
| 2025/09/19 | 013087 | 硅化鈦, 99.5% (metals basis)
Titanium silicide, 99.5% (metals basis) | | 250g | 7145元 |
12039-83-7, 二硅化鈦 相關(guān)搜索:
- metal silicide
- 催化劑
- 金屬催化劑
- 硅化物粉體-硅化鈦（TiSi2)
- 硅化物-二硅化鈦
- 硅化物
- 硅化物粉體-硅化鈦
- 硅化物-硅化鈦
- 硅烷試劑
- TiSi2
- H2Si2Ti
- 硅化鈦粉
- 二硅化鈦 TISI2
- 硅化鈦(TISI2)
- 多層 TI3C2TX
- 二矽化鈦超微粉末,APS 20-30NM
- 二硅化鈦
- 硅化鈦濺射靶, 76.2MM (3.0IN) DIA X 6.35MM (0.250IN) THICK,
- 硅化鈦濺射靶, 76.2MM (3.0IN) DIA X 3.18MM (0.125IN) THICK,
- 硅化鈦濺射靶, 50.8MM (2.0IN) DIA X 6.35MM (0.250IN) THICK,
- 硅化鈦濺射靶, 50.8MM (2.0IN) DIA X 3.18MM (0.125IN) THICK,
- 硅化鈦濺射靶
- 硅化鈦濺射靶,50.8MM(2.0IN)DIAX3.18MM(0.125IN)THICK,99.5%(METALSBASIS)
- 硅化鈦濺射靶,76.2MM(3.0IN)DIAX6.35MM(0.250IN)THICK,99.5%(METALSBASIS)
- 硅化鈦濺射靶,76.2MM(3.0IN)DIAX3.18MM(0.125IN)THICK,99.5%(METALSBASIS)
- 硅化鈦濺射靶,50.8MM(2.0IN)DIAX6.35MM(0.250IN)THICK,99.5%(METALSBASIS)
- 硅化鈦濺射靶, 76.2MM (3.0IN) 直徑 X 6.35MM (0.250IN) 厚, 99.5% (METALS BASIS)
- 硅化鈦濺射靶, 76.2MM (3.0IN) 直徑 X 3.18MM (0.125IN) 厚, 99.5% (METALS BASIS)
- 硅化鈦濺射靶, 50.8MM (2.0IN) 直徑 X 6.35MM (0.250IN) 厚, 99.5% (METALS BASIS)
- 硅化鈦濺射靶, 50.8MM (2.0IN) 直徑 X 3.18MM (0.125IN) 厚, 99.5% (METALS BASIS)
- 二硅化鈦粉
- 硅化鈦
- 12039-83-7
- Calcium (Ca) Sputtering Targets
- titanium(IV) silicide
- Titanium silicide, 99.5%
- TITANIUM SILICIDE ISO 9001：2015 REACH
- Ti3C2Tx (MXene) several layer
- bis(λ2-silanylidene)titanium
- TITANIUM SILICIDE -325 MESH
- Titaniumsilicidemicronpowderblackpowder
- Titanium silicSIT8042.0
- TITANIUM SILICIDE
- TITANIUM DISILICIDE
- Titanium disilicide powder (TiSi2)
- Titanium silicide, 99.5% trace metals basis
- TITANIUM SILICIDE, 95%, powder
- titaniumsilicide(tisi2)
- Titanium silicide sputtering target, 76.2mm (3.0 in.) dia. x 3.18mm (0.125 in.) thick
- Titanium silicide sputtering target, 50.8mm (2.0 in.) dia. x 6.35mm (0.250 in.) thick
- Titanium disilicide nanopowder, APS 20-30nm
- Titanium silicide sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.250in) thick, 99.5% (metals basi
- Titanium silicide sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.125in) thick, 99.5% (metals basi
- Titanium silicide sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.5% (metals basi
- Titanium silicide sputtering target, 50.8mm (2.0in) dia x 3.18mm (0.125in) thick, 99.5% (metals basi
- Titanium silicide sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.250in) thick, 99.5% (metals basis)
- Titanium silicide sputtering target, 50.8mm (2.0in) dia x 3.18mm (0.125in) thick, 99.5% (metals basis)
- Titanium silicide sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.5% (metals basis)